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Non-Micropipe Dislocations in 4H-SiC Devices: Electrical Properties and Device Technology Implications

机译:4H-SiC器件中的非微管位错:电气性能和器件技术含义

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摘要

It is well-known that SiC wafer quality deficiencies are delaying the realization of outstandingly superior 4H-SiC power electronics. While efforts to date have centered on eradicating micropipes (i.e., hollow core super-screw dislocations with Burgers vectors greater than or equal to 2c), 4H-SiC wafers and epilayers also contain elementary screw dislocations (i.e., Burgers vector = 1c with no hollow core) in densities on the order of thousands per sq cm, nearly 100-fold micropipe densities. While not nearly as detrimental to SiC device performance as micropipes, it has recently been demonstrated that elementary screw dislocations somewhat degrade the reverse leakage and breakdown properties of 4H-SiC p(+)n diodes. Diodes containing elementary screw dislocations exhibited a 5% to 35% reduction in breakdown voltage, higher pre-breakdown reverse leakage current, softer reverse breakdown I-V knee, and microplasmic breakdown current filaments that were non-catastrophic as measured under high series resistance biasing. This paper details continuing experimental and theoretical investigations into the electrical properties of 4H-SiC elementary screw dislocations. The nonuniform breakdown behavior of 4H-SiC p'n junctions containing elementary screw dislocations exhibits interesting physical parallels with nonuniform breakdown phenomena previously observed in other semiconductor materials. Based upon experimentally observed dislocation-assisted breakdown, a re-assessment of well-known physical models relating power device reliability to junction breakdown has been undertaken for 4H-SiC. The potential impact of these elementary screw dislocation defects on the performance and reliability of various 4H-SiC device technologies being developed for high-power applications will be discussed.
机译:众所周知,SiC晶片的质量缺陷正在延迟出色的4H-SiC功率电子器件的实现。尽管迄今为止的努力都集中在消除微管上(即,具有Burgers矢量大于或等于2c的空心超螺旋位错),但4H-SiC晶片和外延层也包含基本的螺旋位错(即Burgers vector = 1c,无空心)中心密度)约为每平方厘米数千,是近100倍的微管密度。虽然不像微管那样对SiC器件的性能造成危害,但最近已证明基本的螺旋位错会稍微降低4H-SiC p(+)n二极管的反向泄漏和击穿性能。在高串联电阻偏置下测得,包含基本螺钉位错的二极管的击穿电压降低了5%至35%,击穿前的反向泄漏电流更高,反向击穿的I-V拐点更柔软,微细的击穿电流丝极无灾难性。本文详细介绍了4H-SiC基本螺钉位错的电性能的持续实验和理论研究。包含基本螺钉位错的4H-SiC p'n结的不均匀击穿行为与以前在其他半导体材料中观察到的不均匀击穿现象表现出有趣的物理相似性。根据实验观察到的位错辅助击穿,对4H-SiC进行了将功率器件可靠性与结击穿相关的著名物理模型的重新评估。将讨论这些基本的螺钉错位缺陷对正在开发用于高功率应用的各种4H-SiC器件技术的性能和可靠性的潜在影响。

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